Contrary to their name, rare earth elements (REE) make up a substantial part of the earth’s crust where they do occur dispersed among various minerals. Today, there is a high demand for REEs as lanthanides and actinides are heavily used by the electronic industry, in catalysts and optical displays as well as for high-performance magnets and batteries. Hence, credible trace analysis routines are required for the assessment of potential mining sites, process control solutions (largely comprising of rare earth oxides, REO) and high-purity REEs. Materials containing REOs and REEs are frequently analyzed by ICP techniques. However, adverse REO formation in plasma tail and severe spectral interferences (due to the wealth of emission lines) clearly affect the detectability of REE by ICP-MS and ICPOES
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